Study of bias voltage effect on the performance of ta-C coating prepared by high power impulse magnetron sputtering

The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components. In this paper, the effect of bias parameters on the performance of ta-C coatings was investigated based on high power impulse magnetron sputtering (HiPIMS) technology. The results show that bias voltage has a significant effect on the deposition rate, structure, and wear resistance of the coating. In the range of bias voltage −50 V to −200 V, the ta-C coating performance was the best under bias voltage −150 V. The thickness reached 530.4 nm, the hardness value reached 35.996 GPa, and the bonding force increased to 14.2 N. The maximum sp³ bond content was 59.53% at this condition.